Title :
Optical nonlinearity of oxygen-rich SiOx thin films
Author :
Li, W.T. ; Boswell, R. ; Samoc, M. ; Samoc, A. ; Qin, Q.H.
Author_Institution :
Res. Sch. of Phys. Sci. & Eng., Australian Nat. Univ., Canberra, ACT
Abstract :
Highly oxygen-rich SiOx thin films were prepared using a helicon plasma activated reactive evaporation technique. A small second-order optical nonlinearity was observed in the as-grown films, and thermal poling induced nonlinearity in the films was found to be much larger than that in stoichiometric SiO2 films. These phenomena were associated with the non-impurity defects in the oxygen-rich films
Keywords :
evaporation; nonlinear optics; optical films; plasma materials processing; silicon compounds; ultraviolet spectra; visible spectra; SiOx; as-grown films; helicon plasma activated reactive evaporation; nonimpurity defects; optical nonlinearity; oxygen-rich thin films; stoichiometric films; thermal poling induced nonlinearity;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20073668
