Title :
Disperse pipe trench on silicon by electrochemical etching with pulsed voltage or pulsed illumination
Author :
Lin, J.-C. ; Tsai, W.-C. ; Chen, W.-L.
Author_Institution :
Dept. of Electron. Eng., St. John´´s Univ., Taipei
Abstract :
A novel electrochemical etching on silicon is proposed. A pulsed voltage or a pulsed illumination is used to make a pulsed anodic current that produces a magnetic field around the anodic current path. The Lorentz force centralises the hole accumulating path. Disperse pipe trench patterns can then be obtained
Keywords :
anodisation; electrochemistry; elemental semiconductors; etching; silicon; Lorentz force; Si; anodic current path; disperse pipe trench pattern; electrochemical etching; magnetic field; pulsed anodic current; pulsed illumination; pulsed voltage; silicon; wet etching;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20073657