Title :
X-ray diffraction and magnetic properties of rapid thermal annealed sendust films
Author :
Ullah, M.I. ; Coffey, K.R. ; Parker, M.A. ; Howard, J. Kent
Author_Institution :
Storage Syst. Div., IBM Corp., San Jose, CA, USA
fDate :
11/1/1994 12:00:00 AM
Abstract :
A rapid thermal annealing (RTA) process for sputter deposited sendust (FeSiAl) films is described and the effects of different annealing conditions on key soft magnetic parameters are discussed. X-ray diffraction is used to understand the microstructure of the RTA sendust films and to establish the presence of the ordered DO3 phase. AFM and SEM micrographs are used to describe the morphology of these films
Keywords :
X-ray diffraction; aluminium alloys; atomic force microscopy; ferromagnetic materials; iron alloys; magnetic thin films; rapid thermal annealing; scanning electron microscopy; silicon alloys; soft magnetic materials; sputtered coatings; AFM micrographs; FeSiAl; SEM micrographs; X-ray diffraction; magnetic properties; microstructure; morphology; ordered DO3 phase; rapid thermal annealing; soft magnetic parameters; sputter deposited sendust films; Coercive force; Magnetic anisotropy; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Rapid thermal annealing; Rapid thermal processing; Saturation magnetization; Soft magnetic materials; X-ray diffraction;
Journal_Title :
Magnetics, IEEE Transactions on
