Title :
Ar-sputtered Pt/Co multilayers with large anisotropy energy and coercivity
Author :
Carcia, P.F. ; Reilly, M. ; Li, Z.G. ; van Kesteren, H.W.
Author_Institution :
DuPont Central Res. & Dev., Wilmington, DE, USA
fDate :
11/1/1994 12:00:00 AM
Abstract :
We have discovered a process for Ar-sputtering Pt/Co multilayers, a candidate for high density magneto-optical recording medium, so that they have large anisotropy energy (Keff ~1.2×107 erg/cm3-Co) and large coercivity (Hc ~3.5 kOe) simultaneously. To achieve these improved properties the multilayers were sputtered on granular Pt underlayers, made by etching thin Pt layers, initially 20-40 Å thick. Plan-view transmission electron microscopy revealed that the microstructures of Pt/Co multilayers, grown on etched-Pt underlayers, was also granular with excellent (111)-fcc texture. Both Keff and Hc were optimized, when the (111)-fcc texture was a maximum
Keywords :
Kerr magneto-optical effect; cobalt; coercive force; ferromagnetic materials; magnetic anisotropy; magnetic multilayers; magneto-optical recording; platinum; sputter deposition; sputtered coatings; transmission electron microscopy; (111)-fcc texture; Ar; Ar-sputtering process; Pt-Co; Pt/Co multilayers; anisotropy energy; coercivity; high density magneto-optical recording medium; magneto-optical Kerr effect; plan-view transmission electron microscopy; Anisotropic magnetoresistance; Argon; Coercive force; Magnetic films; Magnetic multilayers; Magnetooptic recording; Nonhomogeneous media; Sputter etching; Sputtering; Substrates;
Journal_Title :
Magnetics, IEEE Transactions on