Magnetic and magnetoelastic properties of amorphous Fe-Si-B-C films

Author

Mattingley, A.D. ; Shearwood, C. ; Gibbs, M.R.J.

Author_Institution

Dept. of Phys., Sheffield Univ., UK

Volume

30

Issue

6

fYear

1994

fDate

11/1/1994 12:00:00 AM

Firstpage

4806

Lastpage

4808

Abstract

We present magnetic and magnetoelastic data measured from a wide range of amorphous films grown by RF sputter deposition. The films were deposited in HV conditions at sputtering pressures of 5 to 80 mTorr and power densities of 1.6 and 3.2 W/cm². Compositions were measured by electron probe micro-analysis (EPMA) and found to be similar to the target material at pressures of 20 mTorr. This pressure also gave the minimum coercivity and minimum stress corresponding to a transition from compressive to tensile stress. All films exhibited in-plane anisotropy, the origin of which is the stray induction from the target magnetron magnets

Keywords

amorphous magnetic materials; boron alloys; coercive force; compressibility; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic thin films; magnetoelastic effects; silicon alloys; sputtered coatings; 5 to 80 mtorr; Fe-Si-B-C; RF sputter deposition; a-FeSiBC films; coercivity; compressive stress; electron probe micro-analysis; in-plane anisotropy; magnetoelastic properties; tensile stress; Amorphous magnetic materials; Amorphous materials; Electrons; Magnetic anisotropy; Magnetic films; Magnetic properties; Perpendicular magnetic anisotropy; Radio frequency; Sputtering; Tensile stress;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.334228

Filename

334228