• DocumentCode
    121335
  • Title

    Polarization-dependent Talbot effect with variable duty cycle

  • Author

    Shubin Li ; Changhe Zhou ; Barbastathis, George

  • Author_Institution
    Shanghai Inst. of Opt. & Fine Mech., Shanghai, China
  • fYear
    2014
  • fDate
    17-21 Aug. 2014
  • Firstpage
    183
  • Lastpage
    184
  • Abstract
    It has recently been observed that the location of Talbot planes becomes dependent on polarization of the incident light for grating periods in the rage of 2~3 free-space wavelengths. Here, we investigate the effect of grating duty cycle and its potential use for control of two- or three-dimensional pattern formation in nanolithography.
  • Keywords
    Talbot effect; diffraction gratings; light polarisation; nanolithography; nanophotonics; Talbot planes; nanolithography; pattern formation; polarization-dependent Talbot effect; variable duty cycle; Delays; Diffraction; Gratings; Indexes; Optical polarization; Optimized production technology; Talbot effect;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS and Nanophotonics (OMN), 2014 International Conference on
  • Conference_Location
    Glasgow
  • ISSN
    2160-5033
  • Print_ISBN
    978-0-9928-4140-9
  • Type

    conf

  • DOI
    10.1109/OMN.2014.6924584
  • Filename
    6924584
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=121335