DocumentCode :
1213960
Title :
Attenuation mechanisms of aluminum millimeter-wave coplanar waveguides on silicon
Author :
Schöllhorn, Claus ; Zhao, Weiwei ; Morschbach, Michael ; Kasper, Erich
Author_Institution :
Inst. fur Halbleitertechnik, Stuttgart Univ., Germany
Volume :
50
Issue :
3
fYear :
2003
fDate :
3/1/2003 12:00:00 AM
Firstpage :
740
Lastpage :
746
Abstract :
The loss mechanisms of silicon coplanar waveguides (CPW) with aluminum metallization are investigated up to 40 GHz. Three main parts contribute to the attenuation of coplanar waveguides (CPWs): the frequency-dependent conductor losses of the metallization, frequency-independent substrate losses, and the specifically investigated bias-dependent interface losses caused by free charges at the Si-SiO2 interface. The minimum losses found in 50-Ω CPWs with 45-μm signal line width were 0.19 db/mm at 10 GHz and 0.33 dB/mm at 40 GHz. High-purity silicon from a float zone (FZ) process was used as substrate. Substrates with lower purity from a Czochralski (CZ) process (resistivity 50-100 Ωcm) resulted in somewhat higher (0.2-0.3 dB/mm) losses for the same CPW geometry.
Keywords :
MIMIC; aluminium; coplanar waveguides; equivalent circuits; integrated circuit metallisation; losses; semiconductor-insulator boundaries; silicon; 10 to 40 GHz; 45 micron; 50 to 100 ohmcm; Al MM-wave CPWs; Al metallization; Czochralski process; Si MIMICs; Si coplanar waveguides; Si-SiO2 interface; Si-SiO2-Al; bias-dependent interface losses; float zone process; frequency-dependent conductor losses; frequency-independent substrate losses; loss mechanisms; Aluminum; Attenuation; Conductivity; Conductors; Coplanar waveguides; Frequency; Geometry; Metallization; Silicon; Waveguide components;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2003.810466
Filename :
1202605
Link To Document :
بازگشت