DocumentCode :
1219115
Title :
A Small Microwave Plasma Source for Long Column Production without Magnetic Field
Author :
Moisan, Michel ; Beaudry, Claude ; Leprince, Philippe
Author_Institution :
Département de Physique, Université de Montréal Montréal 101, Québec
Volume :
3
Issue :
2
fYear :
1975
fDate :
6/1/1975 12:00:00 AM
Firstpage :
55
Lastpage :
59
Abstract :
A new HF device is described. It allows the production, without the use of a magnetic field, of long plasma columns from a small HF coupling structure situated at one end of the column. Its operation is based on the propagation of a cold plasma surface wave. This device can work (in argon for example) at pressures from 2 mTorr to 20 Torr with electron densities from 1010 cm-3 to 1013 cm-3, depending on plasma diameter and HF power. Typically, 80W of 500 MHz HF will produce a 25 mn diameter column of 1.8 m length. The plasma is quiescent (low electron density fluctuations), efficient (~ 100% absorbed power), and perfectly reproducible. It can be used as a substitute for a positive column, and some practical applications are foreseen in ion production, laser excitation, gas preionization and spectroscopic sources.
Keywords :
Couplings; Electrons; Hafnium; Magnetic fields; Microwave devices; Plasma density; Plasma devices; Plasma sources; Plasma waves; Production;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.1975.4316875
Filename :
4316875
Link To Document :
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