DocumentCode :
1220867
Title :
The nonequilibrium inversion layer charge of the thin-film SOI MOSFET
Author :
Ortiz-Conde, Adelmo ; Sanchez, Francisco J Garcia ; Schmidt, Pierre E. ; Sa-Neto, Augusto
Author_Institution :
Dept. of Electron., Simon Bolivar Univ., Caracas, Venezuela
Volume :
36
Issue :
9
fYear :
1989
fDate :
9/1/1989 12:00:00 AM
Firstpage :
1651
Lastpage :
1656
Abstract :
A previous charge-sheet model (A. Ortiz-Conde et al., Solid-State Electron., vol.31, p.1497-1500, Oct. 1988) for the equilibrium inversion layer charge of the thin-film SOI MOSFET is extended to account for nonequilibrium conditions, which occur under normal operation of the device. This is of vital importance to an analytical description of its current-voltage characteristics. The extended model is valid for all inversion conditions and accounts for the charge coupling between the front and back gates. The resulting analytical expression for the inversion-layer charge produces an error of less than 5% with respect to the numerical results obtained from the one-dimensional Poisson equation with the approximation of quasi-equilibrium
Keywords :
insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; thin film transistors; analytical expression; charge coupling; current-voltage characteristics; inversion conditions; model; nonequilibrium conditions; nonequilibrium inversion layer charge; normal operation; thin-film SOI MOSFET; Capacitance; Computer hacking; Current-voltage characteristics; Electrons; Equations; MOSFET circuits; Semiconductor films; Thin film devices; Transistors; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.34227
Filename :
34227
Link To Document :
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