DocumentCode :
122089
Title :
a-Si:H/TCO contact resistance measurement using a Kelvin cross bridge resistor
Author :
Koswatta, Priyaranga ; Holman, Zachary
Author_Institution :
Arizona State Univ., Tempe, AZ, USA
fYear :
2014
fDate :
8-13 June 2014
Firstpage :
2495
Lastpage :
2498
Abstract :
Many have studied and reported properties of silicon heterojunctions solar cells in great detail, including open-circuit voltage and short-circuit current losses. However, little investigation has been dedicated to studying the series resistance contributions, especially at the maximum power point. Contact resistance between amorphous silicon and a transparent conductive oxide can have a significant contribution to series resistance, especially in silicon heterojunction solar cells. We propose the use of Kelvin cross bridge resistors to accurately measure the contact resistance between the doped amorphous silicon layer and the transparent conductive oxide layer typically found in a silicon heterojunction solar cell. This method allows an accurate measurement of the contact resistance without the interference of the sheet resistance of the highly resistive amorphous silicon layer.
Keywords :
amorphous semiconductors; contact resistance; elemental semiconductors; resistors; semiconductor heterojunctions; short-circuit currents; silicon; solar cells; Kelvin cross bridge resistor; Si:H; TCO contact resistance measurement; doped amorphous silicon layer; highly resistive amorphous silicon layer; maximum power point; open-circuit voltage; series resistance; sheet resistance; short-circuit current losses; silicon heterojunctions solar cells; transparent conductive oxides; Contact resistance; Current measurement; Electrical resistance measurement; Photovoltaic cells; Resistance; Semiconductor device measurement; Silicon; Kelvin cross bridge resistor; amorphous silicon; contact resistance; silicon heterojunction; transparent conductive oxides;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialist Conference (PVSC), 2014 IEEE 40th
Conference_Location :
Denver, CO
Type :
conf
DOI :
10.1109/PVSC.2014.6925436
Filename :
6925436
Link To Document :
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