DocumentCode :
1221670
Title :
Mixing finite elements and finite differences for the analysis of silicon on sapphire
Author :
Hoole, S. Ratnajeevan H
Author_Institution :
Dept. of Eng., Harvey Mudd Coll., Claremont, CA, USA
Volume :
25
Issue :
4
fYear :
1989
fDate :
7/1/1989 12:00:00 AM
Firstpage :
2831
Lastpage :
2833
Abstract :
The analysis of electron devices involves the solution of the Poisson equation, made nonlinear as a result of the charge cloud density being a function of the unknown potential. Because of the nonlinear term, the finite-element scheme becomes time consuming. However, the finite difference method, which is shown to model the term Δ2 more accurately, cannot handle line charge densities and the rapid variation in the source term near such charge accumulations. It is shown that there is much to be gained by mixing the two methods in analyzing electron devices, and the method is demonstrated for a silicon-on-sapphire device
Keywords :
finite element analysis; sapphire; semiconductor device models; silicon; Poisson equation; Si-Al2O3; charge cloud density; electron devices; finite difference method; finite elements; line charge densities; silicon on sapphire; Clouds; Difference equations; Educational institutions; Electron devices; Finite difference methods; Finite element methods; Numerical analysis; Poisson equations; Silicon; Symmetric matrices;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.34298
Filename :
34298
Link To Document :
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