Title :
Microphotonics devices based on silicon microfabrication technology
Author :
Tsuchizawa, Tai ; Yamada, Koji ; Fukuda, Hiroshi ; Watanabe, Toshifumi ; Jun-ichi Takahashi ; Takahashi, Jun-ichi ; Shoji, Tetsufumi ; Tamechika, Emi ; Itabashi, Sei-ichi ; Morita, Hirofumi
Author_Institution :
NTT Microsystem Integration Labs., Atsugi, Japan
Abstract :
This work presents our recent progress in the development of an Si wire waveguiding system for microphotonics devices. The Si wire waveguide promises size reduction and high-density integration of optical circuits due to its strong light confinement. However, large connection and propagation losses had been serious problems. We solved these problems by using a spot-size converter and improving the microfabrication technology. As a result, propagation losses as low as 2.8 dB/cm for a 400×200 nm waveguide and a coupling loss of 0.5 dB per connection were obtained. As we have the technologies for the fabrication of complex, practical optical devices using Si wire waveguides, we used them to make microphotonics devices, such as a ring resonator and lattice filter. The devices we made exhibit excellent characteristics because of the microfabrication with the precision of a few nanometers. We have also demonstrated that Si wire waveguides have great potential for use in nonlinear optical devices.
Keywords :
elemental semiconductors; micro-optics; optical couplers; optical fabrication; optical losses; optical waveguides; silicon; Si; Si wire waveguide; coupling loss; lattice filter; microphotonics; propagation losses; ring resonator; silicon microfabrication technology; spot-size converter; Coupling circuits; Integrated optics; Nonlinear optics; Optical filters; Optical losses; Optical ring resonators; Optical waveguides; Propagation losses; Silicon; Wire;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/JSTQE.2004.841479