DocumentCode :
1241913
Title :
Investigation on the dynamics of cross-tie walls in elliptical permalloy elements
Author :
Chang, Y.C. ; Chang, C.C. ; Hsieh, W.Z. ; Lee, H.M. ; Wu, J.C.
Author_Institution :
Dept. of Phys., Nat. Changhua Univ. of Educ., Taiwan
Volume :
41
Issue :
2
fYear :
2005
Firstpage :
959
Lastpage :
961
Abstract :
The magnetization reversal of micrometer-sized permalloy ellipses having cross-tie walls was investigated by means of magnetic-force microscopy and magnetoresistance measurements. Elliptical elements were fabricated using electron-beam lithography, in which an aspect ratio from 2 to 3 and thickness of 72 nm were accordingly designed. The magnetization reversal process illustrated main wall propagation along the short axis with the external field applied in the long-axis direction, while the reversal took place through annihilation of adjacent Nëel-type cores when the external field was applied in the short-axis direction. In addition, the longitudinal magnetoresistance curve showed many steps that are believed to be due to the propagation of the cross-tie wall associated with the annihilation of Nëel-type cores.
Keywords :
Permalloy; electron beam lithography; magnetic force microscopy; magnetisation reversal; magnetoresistance; Neel-type cores; cross-tie walls; electron-beam lithography; elliptical Permalloy elements; magnetic-force microscopy; magnetization reversal; magnetization switching; magnetoresistance measurements; main wall propagation; micrometer-sized Permalloy ellipses; Lithography; Magnetic domain walls; Magnetic domains; Magnetic field measurement; Magnetic films; Magnetic force microscopy; Magnetization reversal; Magnetoresistance; Magnetostatics; Scanning electron microscopy; Cross-tie wall; magnetic-force microscope (MFM); magnetization switching; magnetoresistance; permalloy;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2004.842135
Filename :
1396270
Link To Document :
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