Transmission of light through slit apertures in metallic films

Author

Mansuripur, Masud ; Xie, Yong ; Zakharian, Armis R. ; Moloney, Jerome V.

Author_Institution

Opt. Sci. Center, Univ. of Arizona, Tucson, AZ, USA

Volume

41

Issue

2

fYear

2005

Firstpage

1012

Lastpage

1015

Abstract

Transmission of polarized light through subwavelength slit apertures is studied based on the electromagnetic field distributions obtained in finite difference time domain computer simulations. The results show the existence of a cutoff for E_|| and a strong transmission (with no cutoff) for E_⊥, where || and ⊥ refer to the direction of the incident E-field relative to the long axis of the slit. Interference between the charges and currents induced in the vicinity of two adjacent slits is shown to result in enhanced transmission through both slits when the slits are separated by about one- half of one wavelength.

Keywords

finite difference time-domain analysis; light scattering; light transmission; metallic thin films; electromagnetic field distributions; electromagnetic scattering; finite difference time domain computer simulation; light through slit apertures; metallic films; optics; polarized light transmission; subwave-length slit apertures; Apertures; Finite difference methods; Gratings; Lighting; Optical films; Optical microscopy; Optical polarization; Optical scattering; Optical surface waves; Two dimensional displays; Diffraction; electromagnetic scattering; optics;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/TMAG.2004.842048

Filename

1396285