DocumentCode :
1257032
Title :
Prediction and Modeling of Thin Gate Oxide Breakdown Subject to Arbitrary Transient Stresses
Author :
Ellis, David F. ; Zhou, Yuanzhong ; Salcedo, Javier A. ; Hajjar, Jean-Jacques ; Liou, Juin J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Univ. of Central Florida, Orlando, FL, USA
Volume :
57
Issue :
9
fYear :
2010
Firstpage :
2296
Lastpage :
2305
Abstract :
A reliable dielectric breakdown model under transient stresses via an extension of the power law is demonstrated. The model, which is based on the percolation model and the assumption of no significant detrapping, is successfully used in ramped voltage stress breakdown analysis. A demonstration of the model´s validity consists of applying repetitive time-variant voltage waveforms-pulses, sine waves, ramps, and noise-until breakdown and, consequently, comparing prediction to reality. The breakdown distribution is initially derived from DC measurements, with the model predicting both the center and the shape of the distribution.
Keywords :
electric breakdown; DC measurements; arbitrary transient stresses; breakdown distribution; dielectric breakdown model; noise; percolation model; power law; ramped voltage stress breakdown analysis; ramps; repetitive time-variant voltage waveforms-pulses; sine waves; thin gate oxide breakdown; transient stresses; Breakdown voltage; Dielectric breakdown; Dielectrics; Electric breakdown; Electrostatic discharge; Power system transients; Power transmission lines; Predictive models; Pulse measurements; Shape measurement; Stress; Transient analysis; Voltage measurement; Charged device model (CDM); gate oxide breakdown (GOB); power law (PL); time-dependent dielectric breakdown (TDDB); very fast transmission line pulse (VFTLP);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2053864
Filename :
5523927
Link To Document :
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