• DocumentCode
    1257809
  • Title

    Low-Noise Microwave Performance of 0.1 \\mu m Gate AlInN/GaN HEMTs on SiC

  • Author

    Sun, Haifeng ; Alt, Andreas R. ; Benedickter, Hansruedi ; Feltin, Eric ; Carlin, Jean-François ; Gonschorek, Marcus ; Grandjean, Nicolas ; Bolognesi, C.R.

  • Author_Institution
    Millimeter-Wave Electron. Group, ETH-Zurich, Zürich, Switzerland
  • Volume
    20
  • Issue
    8
  • fYear
    2010
  • Firstpage
    453
  • Lastpage
    455
  • Abstract
    We report the first microwave noise characterization of AlInN/GaN HEMTs. Transistors with a 0.1 μ m gate implemented on a semi-insulating SiC substrate achieve a maximum current density of 1.92 A/mm at VGS = 0 V, a measured transconductance gM = 480 mS/mm, and a peak current gain cutoff frequency fT = 121 GHz with a simultaneous maximum oscillation frequency fMAX = 142 GHz. At 10 (20) GHz, our HEMTs exhibit a minimum noise figure Fmin of 0.62 (1.5) dB together with a high associated gain GA of 15.4 (13.3) dB. The Fmin values are among the lowest reported in nitride HEMTs, and the GA values are the best so far found in the literature, demonstrating the excellent potential of AlInN/GaN HEMTs for low-noise microwave applications.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; indium compounds; microwave field effect transistors; semiconductor device noise; silicon compounds; wide band gap semiconductors; AlInN-GaN; AlInN-GaN HEMT; SiC; frequency 121 GHz; low-noise microwave performance; microwave noise characterization; oscillation frequency; peak current gain cutoff frequency; semiinsulating substrate; size 0.1 micron; transconductance; AlInN/GaN; high-electron mobility transistors (HEMTs); microwave noise;
  • fLanguage
    English
  • Journal_Title
    Microwave and Wireless Components Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1531-1309
  • Type

    jour

  • DOI
    10.1109/LMWC.2010.2049008
  • Filename
    5524058