DocumentCode
1257809
Title
Low-Noise Microwave Performance of 0.1
m Gate AlInN/GaN HEMTs on SiC
Author
Sun, Haifeng ; Alt, Andreas R. ; Benedickter, Hansruedi ; Feltin, Eric ; Carlin, Jean-François ; Gonschorek, Marcus ; Grandjean, Nicolas ; Bolognesi, C.R.
Author_Institution
Millimeter-Wave Electron. Group, ETH-Zurich, Zürich, Switzerland
Volume
20
Issue
8
fYear
2010
Firstpage
453
Lastpage
455
Abstract
We report the first microwave noise characterization of AlInN/GaN HEMTs. Transistors with a 0.1 μ m gate implemented on a semi-insulating SiC substrate achieve a maximum current density of 1.92 A/mm at VGS = 0 V, a measured transconductance gM = 480 mS/mm, and a peak current gain cutoff frequency fT = 121 GHz with a simultaneous maximum oscillation frequency fMAX = 142 GHz. At 10 (20) GHz, our HEMTs exhibit a minimum noise figure Fmin of 0.62 (1.5) dB together with a high associated gain GA of 15.4 (13.3) dB. The Fmin values are among the lowest reported in nitride HEMTs, and the GA values are the best so far found in the literature, demonstrating the excellent potential of AlInN/GaN HEMTs for low-noise microwave applications.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; indium compounds; microwave field effect transistors; semiconductor device noise; silicon compounds; wide band gap semiconductors; AlInN-GaN; AlInN-GaN HEMT; SiC; frequency 121 GHz; low-noise microwave performance; microwave noise characterization; oscillation frequency; peak current gain cutoff frequency; semiinsulating substrate; size 0.1 micron; transconductance; AlInN/GaN; high-electron mobility transistors (HEMTs); microwave noise;
fLanguage
English
Journal_Title
Microwave and Wireless Components Letters, IEEE
Publisher
ieee
ISSN
1531-1309
Type
jour
DOI
10.1109/LMWC.2010.2049008
Filename
5524058
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