• DocumentCode
    1258201
  • Title

    Development of Self-Organized Filaments in a Microgap Atmospheric Barrier Discharge on Bismuth Silicon Oxide Dielectrics

  • Author

    Fue, Hiroyuki ; Hasegawa, Tatsuya ; Sato, Tomohiko ; Mukaigawa, Seiji ; Takaki, Koichi ; Fujiwara, Tamiya

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Iwate Univ., Morioka, Japan
  • Volume
    39
  • Issue
    11
  • fYear
    2011
  • Firstpage
    2140
  • Lastpage
    2141
  • Abstract
    In this paper, we present subsequent images of self-organized filaments in a microgap atmospheric barrier discharge with and without bismuth silicon oxide (BSO) dielectrics. The images were obtained using an intensified charge-coupled device digital camera. Different developments of the discharge were observed in the region occupied by the filaments in the case of BSO and glass dielectrics. The charge distribution on the dielectric surface played an important role in the development of the self-organized patterns.
  • Keywords
    bismuth alloys; discharges (electric); plasma diagnostics; plasma transport processes; BSO; bismuth silicon oxide dielectrics; charge distribution; glass dielectrics; intensified charge-coupled device digital camera; microgap atmospheric barrier discharge; self-organized filament image; self-organized pattern development; Crystals; Dielectrics; Discharges; Glass; Indium tin oxide; Surface discharges; Surface treatment; Bismuth silicon oxide (BSO); dielectric barrier discharge; helium; microgap discharge; self-organized discharge;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2011.2157979
  • Filename
    5930371