Title :
In-situ conductance measurement of surface specularity of NiFe, Co, Cu, Ag and Ta thin films
Author :
Yamada, Kenichiro ; Bailey, William E. ; Féry, Christophe ; Wang, Shan X.
Author_Institution :
Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
fDate :
9/1/1999 12:00:00 AM
Abstract :
We have performed in-situ sheet conductance measurements of Co, Cu, Ni80Fe20, Ag, and Ta films during their growth on NiO or SiO2 surfaces. The specularity and the roughness of the films are determined based on the Fuchs-Namba model. The roughness from the Fuchs-Namba model are compared with that measured by AFM. The material dependence of specularity is obtained. No appreciable difference in specularity has been found when the magnetic films are deposited on NiO or SiO2 surfaces
Keywords :
atomic force microscopy; cobalt; copper; electrical resistivity; iron alloys; magnetic thin films; nickel alloys; rough surfaces; silver; sputter deposition; surface topography; tantalum; Ag; Co; Cu; Fuchs-Namba model; NiFe; NiO; NiO surfaces; SiO2; SiO2 surfaces; Ta; giant magnetoresistance; growth; in-situ conductance measurement; magnetic films; material dependence; roughness; spin valves; surface specularity; thin films; Conductive films; Conductivity; Giant magnetoresistance; Magnetic films; Rough surfaces; Spin valves; Sputtering; Substrates; Surface roughness; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
