DocumentCode
1284293
Title
Laser `direct writing´ of silicon pn junctions
Author
Milne, D. ; Black, A. ; Wilson, John I. B. ; John, P.
Author_Institution
Heriot-Watt Univ., Edinburgh
Volume
24
Issue
1
fYear
1988
fDate
1/7/1988 12:00:00 AM
Firstpage
19
Lastpage
20
Abstract
Rectifying pn junctions have been deposited by a focused argon laser beam from silane and dopant gases on to oxidised silicon wafers. The characteristics depend on the deposition conditions and on the dopant gas content but are not those of ideal junctions, probably due to a nonabrupt interface from the present growth parameter values
Keywords
chemical vapour deposition; elemental semiconductors; p-n homojunctions; silicon; solid-state rectifiers; Si; deposition conditions; dopant gas content; growth parameter values; laser direct writing; nonabrupt interface; pn junctions; rectifying junctions; silane;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
Filename
8136
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