Control of Bragg grating resonant wavelength through its dependence on the effective index of a waveguide

Author

Bradley, Eric M. ; Yu, P.K.L. ; Mathis, R.F.

Author_Institution

Tetra Tech Data Syst., Carlsbad, CA, USA

Volume

15

Issue

7

fYear

1997

fDate

7/1/1997 12:00:00 AM

Firstpage

1156

Lastpage

1164

Abstract

Fabrication tolerances for control of the Bragg wavelength of gratings in waveguides are studied. Techniques are demonstrated to hold the period of the grating constant to ±0.04 nm over the majority of the exposed wafer area, and ridge waveguides fabricated with standard thin film process equipment are found to have Bragg wavelengths constant to within ±0.2 nm. Additionally, adjacent ridges with differing widths are written in a single photomask/etch process step and found to controllably shift the Bragg wavelength over a 10-20-nm band suitable for a distributed Bragg reflector (DBR) laser array or a monolithic comb filter for wavelength division multiplexing (WDM) filtering/routing arrays

Keywords

diffraction gratings; distributed Bragg reflector lasers; integrated optics; optical fabrication; optical variables control; optical waveguide filters; refractive index; ridge waveguides; semiconductor laser arrays; waveguide lasers; wavelength division multiplexing; Bragg grating resonant wavelength control; Bragg wavelength shift; DBR laser array; WDM filtering/routing arrays; fabrication tolerances; monolithic comb filter; ridge waveguides; single photomask/etch process step; waveguide effective index dependence; wavelength division multiplexing; Bragg gratings; Distributed Bragg reflectors; Etching; Filters; Optical arrays; Optical control; Optical device fabrication; Resonance; Transistors; Wavelength division multiplexing;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.596961

Filename

596961