Title :
Low-Loss Multiple-Slot Waveguides Fabricated by Optical Lithography and Atomic Layer Deposition
Author :
Karvonen, Lasse ; Säynätjoki, Antti ; Chen, Ya ; Tu, Xiaoguang ; Liow, Tsung-Yang ; Hiltunen, Jussi ; Hiltunen, Marianne ; Lo, Guo-Qiang ; Honkanen, Seppo
Author_Institution :
Sch. of Electr. Eng., Aalto Univ., Aalto, Finland
Abstract :
We demonstrate silicon-based multiple-slot waveguides filled with dual atomic layer deposited oxide layers. Slot modes for both polarizations, transverse electric (TE) and transverse magnetic (TM), are supported in the waveguide. Propagation loss in the order of 8 dB/cm is achieved for the TE-polarization and 4 dB/cm for the TM-polarization in the waveguides with dual (Al2O3-TiO2) thin film layers. The devices are fabricated using low-temperature complementary metal-oxide-semiconductor compatible processes. To our knowledge, this is the first demonstration of dual-filled slot waveguides.
Keywords :
CMOS integrated circuits; aluminium compounds; atomic layer deposition; integrated optoelectronics; light polarisation; light propagation; optical fabrication; optical films; optical losses; optical waveguides; photolithography; silicon-on-insulator; thin films; titanium compounds; Al2O3-TiO2; Si; TE polarizations; TM polarizations; dual atomic layer deposited oxide layers; dual thin film layers; dual-filled slot waveguides; low-loss multiple-slot waveguides; low-temperature complementary metal-oxide-semiconductor compatible processes; optical lithography; propagation loss; slot modes; transverse electric polarizations; transverse magnetic polarizations; Lithography; Optical waveguides; Optimized production technology; Propagation losses; Rails; Silicon; Atomic layer deposition (ALD); integrated optics; slot waveguide;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2012.2219856
