• DocumentCode
    12908
  • Title

    Nanoindentation-Induced Pop-In Effects in GaN Thin Films

  • Author

    Sheng-Rui Jian ; Jenh-Yih Juang

  • Author_Institution
    Dept. of Mater. Sci. & Eng., I-Shou Univ., Kaohsiung, Taiwan
  • Volume
    12
  • Issue
    3
  • fYear
    2013
  • fDate
    May-13
  • Firstpage
    304
  • Lastpage
    308
  • Abstract
    The nanoindentation-induced pop-in phenomena in GaN thin film are investigated using Berkovich indenters. The formation of dislocation rosettes revealed by cathodoluminescence (CL) spectroscopy is found to closely relate with the pop-in effect displayed in depth-sensitive measurements. Namely, the CL images of the indented spots show well-defined rosette structures consistent with the hexagonal symmetry of GaN, indicating that the distribution of deformation-induced extended defects/dislocations may dramatically affect the CL emission. The use of CL thus may provide an alternative means for studying the near-surface plasticity in other semiconductor thin films, as well.
  • Keywords
    III-V semiconductors; cathodoluminescence; deformation; dislocation loops; gallium compounds; nanoindentation; plasticity; semiconductor thin films; wide band gap semiconductors; Berkovich indenters; GaN; cathodoluminescence emission; cathodoluminescence image; cathodoluminescence spectroscopy; deformation-induced extended defects; depth-sensitive measurements; dislocation rosette; hexagonal symmetry; indented spots; nanoindentation-induced pop-in effects; near-surface plasticity; rosette structure; semiconductor thin films; Gallium nitride; III-V semiconductor materials; Nanoscale devices; Semiconductor thin films; Wide band gap semiconductors; Cathodoluminescence (CL); GaN thin films; nanoindentation; pop-in;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2013.2240313
  • Filename
    6412803