Title :
Direct-write pyrolytic laser deposition
Author :
Allen, Susan Davis
Abstract :
Direct-wire pyrolytic laser deposition is capable of maskless pattern generation of a wide range of materials of interest to the semiconductor device industry. Effects that influence the deposition rate and resolution in direct-write thermal deposition are discussed for metallic film deposition from gas and solid phases.
Keywords :
chemical vapour deposition; laser beam applications; metallic thin films; pyrolysis; semiconductor technology; CVD; deposition rate; direct write pyrolytic laser deposition; direct-write thermal deposition; maskless pattern generation; metallic film deposition; resolution; semiconductor device industry; Chemical lasers; Films; Gas lasers; Semiconductor lasers; Substrates;
Journal_Title :
Circuits and Devices Magazine, IEEE
DOI :
10.1109/MCD.1986.6311768
