• DocumentCode
    1293960
  • Title

    Use of the radiation-induced charge neutralization mechanism to achieve annealing of 0.35 /spl mu/m SRAMs

  • Author

    Quittard, O. ; Joffre, F. ; Brisset, C. ; Oudéa, C. ; Saigné, F. ; Dusseau, L. ; Fesquet, J. ; Gasiot, J.

  • Author_Institution
    CEA, Centre d´´Etudes Nucleaires de Saclay, Gif-sur-Yvette, France
  • Volume
    46
  • Issue
    6
  • fYear
    1999
  • Firstpage
    1633
  • Lastpage
    1639
  • Abstract
    Irradiation of electronic devices has varying impact on their electrical characteristics, according to the concomitant bias scenario. Under bias, there is a process of continuous degradation; but recovery will occur if subsequent irradiation is performed without bias voltage. This phenomenon, known as "Radiation-Induced Charge Neutralization" (RICN), was studied by us, using individual components (inverters) and complex integrated circuits (0.35 /spl mu/m static random access memories). Our study focused on the effects of irradiation and bias on electronic component response.
  • Keywords
    SRAM chips; annealing; radiation hardening (electronics); 0.35 micron; CMOS inverter; SRAM; annealing; bias voltage; electrical characteristics; electronic device; integrated circuit; radiation-induced charge neutralization; Annealing; CMOS technology; Circuit testing; Degradation; Electric variables; Inverters; MOS devices; MOSFETs; Random access memory; Voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.819132
  • Filename
    819132