• DocumentCode
    1299522
  • Title

    Self-heating and kink effects in a-Si:H thin film transistors

  • Author

    Wang, Ling ; Fjeldly, Tor A. ; Iniguez, Benjamin ; Slade, Holly C. ; Shur, Michael

  • Author_Institution
    Philips Lab., Briarcliff Manor, NY, USA
  • Volume
    47
  • Issue
    2
  • fYear
    2000
  • fDate
    2/1/2000 12:00:00 AM
  • Firstpage
    387
  • Lastpage
    397
  • Abstract
    We describe a new physics based, analytical DC model accounting for short channel effects for hydrogenated amorphous silicon (a-Si:H) thin film transistors (TFT´s). This model is based on the long channel device model. Two important short-channel phenomena, self-heating and kink effects, are analyzed in detail. For the self-heating effect, a thermal kinetic analysis is carried out and a physical model and an equivalent circuit are used to estimate the thermal resistance of the device. In deriving the analytical model for self-heating effect, a first order approximation and self-consistency are used to give an iteration-free model accurate for a temperature rise of up to 100°C. In the modeling of the kink effects, a semi-empirical approach is used based on the physics involved. The combined model accurately reproduces the DC characteristics of a-Si:H TFT´s with a gate length of the 4 μm. Predictions for a-Si:H TFT´s scaled down to 1 μm are also provided. The model is suitable for use in device and circuit simulators
  • Keywords
    MISFET; amorphous semiconductors; carrier mobility; elemental semiconductors; equivalent circuits; hydrogen; semiconductor device models; silicon; thermal analysis; thermal resistance; thin film transistors; 1 to 4 micron; DC characteristics; Si:H; a-Si:H TFTs; analytical DC model; circuit simulators; device simulators; equivalent circuit; first order approximation; hydrogenated amorphous Si; iteration-free model; kink effect; physics based model; self-consistency; self-heating effects; semiempirical approach; short channel effects; thermal kinetic analysis; thermal resistance; thin film transistors; Amorphous silicon; Analytical models; Circuit simulation; Computer aided manufacturing; Equivalent circuits; Physics; Systems engineering and theory; Temperature dependence; Thermal resistance; Thin film transistors;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.822285
  • Filename
    822285