DocumentCode :
1302211
Title :
CMOS Open-Gate Ion-Sensitive Field-Effect Transistors for Ultrasensitive Dopamine Detection
Author :
Li, Dong-Che ; Yang, Po-Hung ; Lu, Michael S C
Author_Institution :
Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume :
57
Issue :
10
fYear :
2010
Firstpage :
2761
Lastpage :
2767
Abstract :
Open-gate ion-sensitive field-effect transistors (ISFETs) are presented in this paper to provide a real-time ultrasensitive dopamine (DA) detection in the femtomolar (fM) range. The polysilicon gates of p-type FETs fabricated in a 0.35-μm complementary metal-oxide-semiconductor (CMOS) process were removed by a convenient post-CMOS process to expose the gate oxide for surface functionalization and biomolecule immobilization. The measured current value increased due to the produced negative charges from binding of the 4-carboxyphenylboronic acid and DA molecules. The thin gate oxide, as the sensing interface, significantly enhances the detection limit, which is comparable to or better than most nanowire-based ISFETs. A self-oscillating readout circuit was used to convert the ISFET current to a digital output for the measurement of multiple sensors, showing the strength of the CMOS-based approach for sensor integration.
Keywords :
CMOS integrated circuits; biosensors; ion sensitive field effect transistors; nanowires; organic compounds; readout electronics; 4-carboxyphenylboronic acid binding; CMOS ISFET sensors; CMOS open-gate ion-sensitive field-effect transistors; DA molecules; ISFET; biomolecule immobilization; complementary metal-oxide-semiconductor process; femtomolar range; nanowire-based ISFET; negative charges; p-type FET; polysilicon gates; post-CMOS process; self-oscillating readout circuit; sensing interface; sensor integration; size 0.35 mum; surface functionalization; thin gate oxide; ultrasensitive dopamine detection; CMOS integrated circuits; Current measurement; Frequency modulation; Logic gates; Sensors; Threshold voltage; Transistors; Carboxyphenylboronic acid (CPBA); gate oxide; immobilization; ion-sensitive field-effect transistor (ISFET); wet etch;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2010.2063330
Filename :
5555969
Link To Document :
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