Title :
A 6-
W Chip-Area-Efficient Output-Capacitorless LDO in 90-nm CMOS Technology
Author :
Guo, Jianping ; Leung, Ka Nang
Author_Institution :
Dept. of Electron. Eng., Chinese Univ. of Hong Kong, Shatin, China
Abstract :
An output-capacitorless low-dropout regulator (LDO) compensated by a single Miller capacitor is implemented in a commercial 90-nm CMOS technology. The proposed LDO makes use of the small transistors realized in nano-scale technology to achieve high stability, fast transient performance and small voltage spikes under rapid load-current changes without the need of an off-chip capacitor connected at the LDO output. Experimental result verifies that the proposed LDO is stable for a capacitive load from 0 to 50 pF (estimated equivalent parasitic capacitance from load circuits) and with load capability of 100 mA. Moreover, the gain-enhanced structure provides sufficient loop gain to improve line regulation to 3.78 mV/V and load regulation to 0.1 mV/mA, respectively. The embedded voltage-spike detection circuit enables pseudo Class-AB operation to drive the embedded power transistor promptly. The measured power consumption is only 6 μW under a 0.75-V supply. The maximum overshoot and undershoot under a 1.2-V supply are less than 66 mV for full load current changes within 100-ns edge time, and the recovery time is less than 5 μs.
Keywords :
CMOS integrated circuits; power transistors; CMOS technology; Miller capacitor; capacitance 0 pF to 50 pF; chip-area-efficient output-capacitorless low-dropout regulator; current 100 mA; embedded power transistor; embedded voltage-spike detection circuit; load circuits; nanoscale technology; parasitic capacitance; power 6 muW; pseudo class-AB operation; size 90 nm; time 100 ns; voltage 0.75 V; voltage 1.2 V; CMOS integrated circuits; CMOS technology; Capacitors; Circuit stability; Load modeling; Logic gates; Transient analysis; Capacitor-less; low-dropout regulator (LDO); nano-scale technology; transient response;
Journal_Title :
Solid-State Circuits, IEEE Journal of
DOI :
10.1109/JSSC.2010.2053859