DocumentCode :
1304057
Title :
Vacuum microelectronic integrated differential amplifier
Author :
Hsu, S.H. ; Kang, W.P. ; Davidson, Jennifer L. ; Huang, J.H. ; Kerns, D.V.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Vanderbilt Univ., Nashville, TN, USA
Volume :
48
Issue :
19
fYear :
2012
Firstpage :
1219
Lastpage :
1220
Abstract :
Reported is a novel vacuum field emission transistor (VFET) differential amplifier (diff-amp) utilising nanocrystalline diamond emitters with self-aligned gate partitions. The integrated VFET diff-amp was fabricated by a dual-mask self-aligned mould transfer method in conjunction with chemical vapour deposited nanodiamond. Identical pairs of devices with well-matched field emission transistor characteristics were obtained, realising a negligible common-mode gain, high differential-mode gain, and large common-mode rejection ratio (CMRR) of 55 dB. The emission current was validated by a modified Fowler-Nordheim equation in transistor configuration, and the CMRR was modelled by an equivalent half-circuit with the calculated result found to agree well with the experimental value.
Keywords :
chemical vapour deposition; diamond; differential amplifiers; field effect transistors; nanostructured materials; vacuum microelectronics; CMRR; VFET diff-amp; chemical vapour deposited nanodiamond; common-mode gain; common-mode rejection ratio; differential-mode gain; dual-mask self-aligned mould transfer method; emission current; equivalent half-circuit; modified Fowler-Nordheim equation; nanocrystalline diamond emitters; self-aligned gate partitions; transistor configuration; vacuum field emission transistor; vacuum microelectronic integrated differential amplifier;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2012.1245
Filename :
6317248
Link To Document :
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