Title :
Magnetic properties, microstructures, and corrosion resistance of high-saturation FeMoN and FeRhN films for recording heads
Author :
Wang, Shan X. ; Sin, Kyusik ; Hong, Jongill ; Nguyentran, Lee
Author_Institution :
Dept. of Mater. Sci. & Eng., Stanford Univ., CA, USA
fDate :
3/1/2000 12:00:00 AM
Abstract :
We have investigated high-saturation FeMoN and FeRhN films, deposited by radio frequency-diode reactive sputtering on alumina-TiC substrates, for inductive head applications. A minimum coercivity of ~1.2 Oe is obtained in (Fe97.8Mo2.2)N films at a N 2/Ar flow ratio of ~6.2%. A minimum coercivity of ~1.6 Oe is obtained in (Fe96.9Rh3.1)N films at a N2/Ar flow ratio of ~4.6%. The films mainly consist of α-Fe phase and γ´-Fe4N phase; The magnetic properties of these films are stable under easy axis field annealing up to 350°C. Addition of Rh or Mo to FeN has resulted in a significant improvement in corrosion resistance over that of FeN. The localized corrosion resistance of FeRhN and FeMoN can be comparable to that of Permalloy. In contrast, their intrinsic corrosion resistance is inferior to that of Permalloy, but it can be adjusted and controlled by pH level
Keywords :
annealing; coercive force; corrosion resistance; iron compounds; magnetic heads; magnetic thin films; molybdenum compounds; rhodium compounds; sputtered coatings; Al2O3; FeMoN; FeRhN; N2/Ar flow ratio; RF diode reactive sputtering; TiC; alumina-TiC substrates; coercivity; corrosion resistance; field annealing; high-saturation films; inductive head; microstructure; pH level; Argon; Coercive force; Corrosion; Iron; Magnetic films; Magnetic heads; Magnetic properties; Microstructure; Radio frequency; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on