• DocumentCode
    1307679
  • Title

    Novel optically excited resonant pressure sensor

  • Author

    Thornton, K.E.B. ; Uttamchandani, D. ; Culshaw, B.

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Strathclyde Univ., UK
  • Volume
    24
  • Issue
    10
  • fYear
    1988
  • fDate
    5/12/1988 12:00:00 AM
  • Firstpage
    573
  • Lastpage
    574
  • Abstract
    A novel pressure sensitive microresonator structure has been fabricated by anisotropic etching of silicon. An intensity modulated laser beam is focused onto the resonator and generates transverse vibrations, which are detected using optical heterodyne interferometric techniques. The pressure and temperature dependence of the resonant frequency of this structure is reported
  • Keywords
    elemental semiconductors; etching; light interferometry; nonelectric sensing devices; pressure measurement; silicon; Si; anisotropic etching; intensity modulated laser beam; microresonator structure; optical heterodyne interferometric techniques; optically excited resonant pressure sensor; resonant frequency; temperature dependence; transverse vibrations;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • Filename
    8266