DocumentCode :
1307786
Title :
Neutron radiation tolerance of advanced UHV/CVD SiGe HBT BiCMOS technology
Author :
Roldán, Juan M. ; Ansley, William E. ; Cressler, John D. ; Clark, Steven D. ; Nguyen-Ngoc, Dominique
Author_Institution :
Alabama Microelectron. Sci. & Technol. Center, Auburn Univ., AL, USA
Volume :
44
Issue :
6
fYear :
1997
fDate :
12/1/1997 12:00:00 AM
Firstpage :
1965
Lastpage :
1973
Abstract :
The effects of 1.0 MeV neutron irradiation on both SiGe heterojunction bipolar transistors (HBTs) and Si CMOS transistors from an advanced ultra high vacuum chemical vapour deposition (UHV/CVD) SiGe BiCMOS technology are examined for the first time over the temperature range of 300 K to 84 K. Results at 300 K indicate that this SiGe technology is robust with respect to neutron radiation. At fluences as high as 1015 n/cm2 (1.0 MeV equivalent) the devices exhibited a degradation of less than 30% in peak current gain. The SiGe HBTs maintain a current gain of 60 after 1015 n/cm 2 at 84 K, compared to the Si BJT which degrades with cooling to a current gain of 20 at 84 K. The cutoff frequencies of both the Si and SiGe transistors are unaffected by neutron irradiation, and only a slight degradation in the maximum oscillation frequency of the transistors was observed
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; MOSFET; heterojunction bipolar transistors; neutron effects; semiconductor materials; 1 MeV; 84 to 300 K; Si; Si CMOS transistors; SiGe; SiGe HBT BiCMOS technology; SiGe heterojunction bipolar transistors; UHV/CVD technology; chemical vapour deposition; cooling; current gain; cutoff frequencies; maximum oscillation frequency; neutron irradiation; neutron radiation tolerance; ultra high vacuum; BiCMOS integrated circuits; CMOS technology; Chemical technology; Chemical vapor deposition; Cutoff frequency; Degradation; Germanium silicon alloys; Heterojunction bipolar transistors; Neutrons; Silicon germanium;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.658970
Filename :
658970
Link To Document :
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