DocumentCode :
1310988
Title :
Vertically Integrated Unidirectional Biristor
Author :
Moon, Dong-Il ; Choi, Sung-Jin ; Kim, Sungho ; Oh, Jae-Sub ; Kim, Young-Su ; Choi, Yang-Kyu
Author_Institution :
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume :
32
Issue :
11
fYear :
2011
Firstpage :
1483
Lastpage :
1485
Abstract :
The unidirectional read-out characteristics of a two-terminal biristor are investigated through numerical simulations and experiments. The base doping profile in the biristor, which is analogous to an open-base bipolar junction transistor (BJT), is a key parameter to control both the multiplication factor and the common-emitter gain of the open-base BJT. The simulated results indicate that the asymmetric base doping produces a difference in the latch-up voltage according to the reading direction. A unidirectional conduction path is thereby implemented in a crossbar-array configuration that consists of only the two-terminal biristor. The experimental results based on a vertical structure with local charge injection support that the leakage path through the reverse read direction can be blocked by the asymmetric base doping structure with the selection of proper bias conditions.
Keywords :
doping profiles; numerical analysis; resistors; asymmetric base doping structure; base doping profile; common-emitter gain; crossbar-array configuration; latch-up voltage; multiplication factor; numerical simulations; reverse read direction; unidirectional conduction; unidirectional read-out characteristics; vertically integrated unidirectional biristor; Arrays; Doping; Impact ionization; Junctions; Latches; Logic gates; Silicon; Biristor; bipolar junction transistor (BJT); bistable resistor; crossbar; open-base breakdown; two-terminal; vertical field-effect transistor (FET);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2163698
Filename :
6006507
Link To Document :
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