Scattering of millimeter waves by metallic strip gratings on an optically plasma-induced semiconductor slab

Author

Nishimura, Kazuo ; Tsutsumi, Makoto

Author_Institution

Fac. of Eng. & Design, Kyoto Inst. of Technol., Japan

Volume

44

Issue

12

fYear

1996

fDate

12/1/1996 12:00:00 AM

Firstpage

2231

Lastpage

2237

Abstract

This paper presents the scattering characteristics of a TE electromagnetic plane wave by metallic strip gratings on an optically induced plasma slab in silicon at millimeter-wave frequencies. The characteristics were analyzed by using the spectral domain Galerkin method and estimated numerically. We examined how to control the resonance anomaly by changing the optically induced plasma density for metallic strip grating structures fabricated on highly resistive silicon. The optical control characteristics of the reflection and the forward scattering pattern of the grating structures were measured at Q band and are discussed briefly with theory

Keywords

Galerkin method; diffraction gratings; electromagnetic wave scattering; millimetre wave devices; millimetre waves; semiconductor plasma; silicon; spectral-domain analysis; EHF; MM-wave scattering; Q-band; Si; TE EM plane wave; forward scattering pattern; highly resistive Si; metallic strip gratings; millimeter waves; optical control characteristics; optically induced plasma; plasma density; reflection; scattering characteristics; semiconductor slab; spectral domain Galerkin method; Electromagnetic scattering; Gratings; Millimeter wave technology; Optical control; Optical scattering; Plasma density; Plasma properties; Silicon; Strips; Tellurium;

fLanguage

English

Journal_Title

Microwave Theory and Techniques, IEEE Transactions on

Publisher

ieee

ISSN

0018-9480

Type

jour

DOI

10.1109/22.556451

Filename

556451