DocumentCode :
1316343
Title :
Enhanced Performance in Epitaxial Graphene FETs With Optimized Channel Morphology
Author :
Yu-Ming Lin ; Farmer, Damon B. ; Jenkins, Keith A. ; Yanqing Wu ; Tedesco, J.L. ; Myers-Ward, Rachael L. ; Eddy, Charles R. ; Gaskill, D. Kurt ; Dimitrakopoulos, Christos ; Avouris, Phaedon
Author_Institution :
IBM T J. Watson Res. Center, Yorktown Heights, NY, USA
Volume :
32
Issue :
10
fYear :
2011
Firstpage :
1343
Lastpage :
1345
Abstract :
This letter reports the impact of surface morphology on the carrier transport and radio-frequency performance of graphene FETs formed on epitaxial graphene synthesized on SiC substrates. Such graphene exhibits long terrace structures with widths between 3-5 μm and steps of 10 ± 2 nm in height. While a carrier mobility value above 3000 cm2/V·s at a carrier density of 1012 cmx2 is obtained in a single graphene terrace, the step edges can result in a step resistance of ~21 kΩ·μm. By orienting the transistor layout so that the entire channel lies within a single graphene terrace and by reducing the access resistance associated with the ungated part of the channel, a cutoff frequency above 200 GHz is achieved for graphene FETs with channel lengths of 210 nm, i.e., the highest value reported on epitaxial graphene thus far.
Keywords :
circuit layout; graphene; millimetre wave field effect transistors; silicon compounds; surface morphology; SiC; access resistance reduction; carrier density; carrier mobility value; carrier transport; channel morphology optimization; epitaxial graphene FET; field-effect transistor; radiofrequency performance; single graphene terrace; size 210 nm; surface morphology; transistor layout; Epitaxial growth; FETs; Logic gates; Morphology; Performance evaluation; Silicon carbide; Field-effect transistor (FET); graphene; radio-frequency (RF);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2011.2162934
Filename :
6012508
Link To Document :
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