• DocumentCode
    1319210
  • Title

    A physical interpretation for the single-event-gate-rupture cross-section of n-channel power MOSFETs

  • Author

    Johnson, G.H. ; Galloway, K.F. ; Schrimpf, R.D. ; Titus, J.L. ; Wheatley, C.F. ; Allenspach, M. ; Dachs, C.

  • Author_Institution
    Arizona Univ., Tucson, AZ, USA
  • Volume
    43
  • Issue
    6
  • fYear
    1996
  • fDate
    12/1/1996 12:00:00 AM
  • Firstpage
    2932
  • Lastpage
    2937
  • Abstract
    The single-event-gate-rupture cross-section is measured as a function of drain-source and gate-source bias for some n-channel power MOSFETs. The experimental techniques are explained, and the results are interpreted with the help of two-dimensional computer modeling
  • Keywords
    ion beam effects; power MOSFET; n-channel power MOSFET; single-event-gate-rupture cross-section; two-dimensional computer model; Charge carrier processes; Cranes; Electrodes; FETs; Ion beams; MOSFETs; Neck; Numerical simulation; Power transistors; Silicon;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.556888
  • Filename
    556888