DocumentCode
1328982
Title
Statistical Weight Kinetics Modeling and Estimation for Silica Nanowire Growth Catalyzed by Pd Thin Film
Author
Huang, Qiang ; Wang, Li ; Dasgupta, Tirthankar ; Zhu, Li ; Sekhar, Praveen K. ; Bhansali, Shekhar ; An, Yu
Author_Institution
Daniel J. Epstein Dept. of Ind. & Syst. Eng., Univ. of Southern California, Los Angeles, CA, USA
Volume
8
Issue
2
fYear
2011
fDate
4/1/2011 12:00:00 AM
Firstpage
303
Lastpage
310
Abstract
This work intends to understand and model the kinetic aspect or the change of substrate weight over time in the selective growth of silica nanowires (NWs) catalyzed through Pd thin film. Various adsorption-induced, diffusion-induced, or unified vapor-liquid-solid (VLS) growth models have been developed to describe the NW length varying with time. Since NW length has been difficult to be measured, substrate weight change is therefore used as an alternative in this study to investigate growth kinetics of NWs. We investigate six different weight kinetics models in predicting weight changes during growth. Model estimation and comparison are conducted using both maximum-likelihood estimation (MLE) and Bayesian approaches. Owing to the embedded kinetics information in the nonlinear growth models, the Bayesian hierarchical model is shown to be more desirable when process data is limited.
Keywords
adsorption; belief networks; catalysis; diffusion; magnetic thin films; nanowires; palladium; silicon compounds; Bayesian approaches; Bayesian hierarchical model; Pd; SiO2; adsorption-induced model; catalysis; diffusion-induced model; maximum-likelihood estimation; nonlinear growth models; silica nanowire growth; statistical weight kinetics estimation; statistical weight kinetics modeling; substrate weight; thin film; unified vapor-liquid-solid growth model; Computational modeling; Kinetic theory; Maximum likelihood estimation; Silicon; Silicon compounds; Substrates; Model selection; nanomanufacturing; nanostructure growth; process modeling;
fLanguage
English
Journal_Title
Automation Science and Engineering, IEEE Transactions on
Publisher
ieee
ISSN
1545-5955
Type
jour
DOI
10.1109/TASE.2010.2070493
Filename
5580014
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