Title :
Electrical Writing of Magnetic Domain Patterns in Ferromagnetic/Ferroelectric Heterostructures
Author :
Lahtinen, T.H.E. ; Tuomi, J.O. ; Van Dijken, S.
Author_Institution :
Sch. of Sci., Dept. of Appl. Phys., Aalto Univ., Aalto, Finland
Abstract :
Coupling between ferromagnetic and ferroelectric domains and electrical writing of magnetic domain patterns are investigated in artificial heterostructures consisting of a ferroelectric BaTiO3 substrate with a well-defined ferroelastic domain structure and a thin CoFe film. Polarization microscopy analysis and micromagnetic simulations show that ferroelastic stripe patterns are fully transferrable to neighboring magnetic films. The one-to-one domain correlations are the result of a strain-mediated coupling mechanism between the in-plane ferroelectric polarization of the BaTiO3 substrate and the magnetic anisotropy of the CoFe film. The ferromagnetic and ferroelectric domains remain coupled in an applied electric field and this enables the writing of new magnetic domain patterns by electrical means.
Keywords :
barium compounds; cobalt alloys; dielectric polarisation; electric domains; ferroelasticity; ferroelectric materials; ferromagnetic materials; iron alloys; magnetic anisotropy; magnetic domains; magnetic thin films; metallic thin films; micromagnetics; optical microscopy; BaTiO<;sub>;3<;/sub>; substrate; BaTiO3; CoFe-BaTiO3; applied electric field; electrical writing; ferroelastic domain structure; ferroelastic stripe patterns; ferroelectric domain; ferroelectric domains; ferromagnetic domain; ferromagnetic-ferroelectric heterostructures; in-plane ferroelectric polarization; magnetic anisotropy; magnetic domain patterns; micromagnetic simulations; polarization microscopy; strain-mediated coupling mechanism; thin film; Magnetic domain walls; Magnetic domains; Magnetic hysteresis; Magnetic resonance imaging; Perpendicular magnetic anisotropy; Saturation magnetization; Electric-field controlled magnetism; magnetic anisotropy; magnetic domains; multiferroics;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2011.2143393