DocumentCode
134111
Title
Boron doped amorphous carbon on n-type silicon with low negative bias by using palm oil precursor
Author
Ishak, A. ; Affendi, Irma Hidayanti ; Ahmed Azhar, Najwa Ezira ; Saurdi, I. ; Abdullah, Mohd Harun ; Malek, M.F. ; Rusop, M.
Author_Institution
NANO - Electron. Centre, Univ. Teknol. MARA, Shah Alam, Malaysia
fYear
2014
fDate
27-29 May 2014
Firstpage
178
Lastpage
182
Abstract
Boron doped heterojunction of amorphous carbon solar cell were successfully fabricated using palm oil precursor in the environment of low negative bias. The open circuit voltage (Voc), current density (JSC), fill factor (FF) and efficiency (%) of boron doped without the use of negative bias (a-C/n-Si) were approximately 0.128244, 0.452821mA/cm2, 0.255398, and 0.014831%, respectively. Meanwhile, the optimize of open circuit voltage (VOC), current density (JSC), fill factor and efficiency of a-C:B/n-Si fabricated by low negative bias were 0.265508V, 5.602622mA/cm2, 0.220737, and 0.328355%, respectively. The conversion efficiency of a-C:B has been improved under the influenced of low negative bias.
Keywords
amorphous semiconductors; boron; silicon; solar cells; C:B-Si; amorphous carbon solar cell; boron doped amorphous carbon; boron doped heterojunction; current density; fill factor; low negative bias; n-type silicon; open circuit voltage; palm oil precursor; Boron; Carbon; Films; Heterojunctions; Photovoltaic cells; Substrates; Amorphous carbon; Boron; Negative bias; Palm-oil; Pyrolysis- CVD; carbon solar cell;
fLanguage
English
Publisher
ieee
Conference_Titel
Technology Management and Emerging Technologies (ISTMET), 2014 International Symposium on
Conference_Location
Bandung
Print_ISBN
978-1-4799-3703-5
Type
conf
DOI
10.1109/ISTMET.2014.6936502
Filename
6936502
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