• DocumentCode
    1343591
  • Title

    Physical and Electrical Performance Limits of High-Speed SiGeC HBTs—Part I: Vertical Scaling

  • Author

    Schröter, Michael ; Wedel, Gerald ; Heinemann, Bernd ; Jungemann, Christoph ; Krause, Julia ; Chevalier, Pascal ; Chantre, Alain

  • Author_Institution
    Dept. of Electr. Eng. & Inf. Technol., Tech. Univ. Dresden, Dresden, Germany
  • Volume
    58
  • Issue
    11
  • fYear
    2011
  • Firstpage
    3687
  • Lastpage
    3696
  • Abstract
    The overall purpose of this paper (including Part I, in this issue) is the prediction of the ultimate electrical high-frequency performance potential for SiGeC heterojunction bipolar transistors under the constraints of practical applications. This goal is achieved by utilizing most advanced device simulation tools with parameters calibrated to existing experimental results. This Part I outlines the overall scaling procedure and then focuses on the vertically scaled structure. According to isothermal device simulation, the “ultimate” doping profile yields a peak transit frequency fT of almost 1.5 THz, a BVCEO above 1 V (dependent on BE bias) and a zero-bias internal base sheet resistance of about 3 kΩ/sq. The reasons for achieving a higher product fTBVCEO(>; 1.5 THzV) than anticipated from the classical Johnson limit are explained. Finally, it is found that fT is limited by the minority charge stored in the BE junction and that BVCEO is mainly determined by the tunneling mechanisms in the base-collector space-charge region.
  • Keywords
    doping profiles; germanium compounds; heterojunction bipolar transistors; semiconductor device models; silicon compounds; tunnelling; BE junction; BVCEO; SiGeC; base-collector space-charge region; classical Johnson limit; device simulation tools; electrical performance limits; heterojunction bipolar transistors; high-speed HBT; isothermal device simulation; peak transit frequency; physical performance limits; tunneling mechanisms; ultimate doping profile; ultimate electrical high-frequency performance potential; vertical scaling; vertically scaled structure; zero-bias internal base sheet resistance; Capacitance; Doping; High definition video; Performance evaluation; Semiconductor process modeling; Silicon germanium; Tunneling; Device scaling; SiGeC heterojunction bipolar transistor (HBT); device simulation; high-performance bipolar technology; physical limits;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2011.2163722
  • Filename
    6036169