• DocumentCode
    1344544
  • Title

    Development of low noise, back-side illuminated silicon photodiode arrays

  • Author

    Holland, S.E. ; Wang, N.W. ; Moses, W.W.

  • Author_Institution
    Lawrence Livermore Nat. Lab., CA, USA
  • Volume
    44
  • Issue
    3
  • fYear
    1997
  • fDate
    6/1/1997 12:00:00 AM
  • Firstpage
    443
  • Lastpage
    447
  • Abstract
    We have developed low noise, high quantum efficiency photodiode arrays for use with positron-emission tomography (PET). A fabrication process developed for high-energy physics detectors was modified to allow for back-side illumination. A back-side contact consisting of a thin (10 nm) n+ polysilicon layer covered by an indium tin oxide (ITO) antireflection coating (57 nm) results in >70% quantum efficiency over the wavelength range of 400-1000 nm. The photodiodes are operated fully depleted (300 μm thick) resulting in a measured capacitance of 3.2 pF and typical leakage currents of 20-50 pA for a 3 mm square element. At room temperature the noise measured at a shaping time of 4 μs is 140 e- rms. When coupled to a CsI(TI) scintillator and excited with 141 keV gamma rays, the energy resolution is 12% fwhm
  • Keywords
    leakage currents; photodiodes; positron emission tomography; silicon radiation detectors; 20 to 50 pA; 3.2 pF; 300 mum; 400 to 1000 nm; CsI(TI) scintillator; PET; Si; antireflection coating; high quantum efficiency photodiode arrays; high-energy physics detectors; indium tin oxide; low noise back-side illuminated silicon photodiode arrays; positron-emission tomography; Detectors; Fabrication; Indium tin oxide; Lighting; Photodiodes; Physics; Positron emission tomography; Silicon; Temperature measurement; Wavelength measurement;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.603687
  • Filename
    603687