Title :
Effect of vacuum ultraviolet radiation on the gap fill properties of Teflon amorphous fluoropolymer film deposited by direct liquid injection
Author :
Parihar, V. ; Singh, R. ; Sharangpani, R. ; Russell, S.D. ; Young, C.A.
Author_Institution :
Dept. of Electr. & Comput. Eng., Clemson Univ., SC, USA
fDate :
7/1/2000 12:00:00 AM
Abstract :
In this work, the roles of vacuum ultraviolet (VUV) photons in improving the gap fill properties of a low dielectric constant (K) material (Teflon amorphous fluoropolymer, K=1.93) deposited by direct liquid injection assisted rapid photothermal chemical vapor deposition technique are discussed. A qualitative explanation is presented wherein it is proposed that high-energy photons provide photoexcitation of the species involved in the deposition of Teflon AFTM, thereby lowering the activation energy and migrational enthalpy required for surface diffusion leading to a higher molecular mobility on the patterned surface
Keywords :
CVD coatings; amorphous state; dielectric thin films; integrated circuit interconnections; permittivity; photoexcitation; polymer films; surface diffusion; ultraviolet radiation effects; Teflon AF; Teflon amorphous fluoropolymer film; VUV photons; activation energy reduction; chemical vapor deposition; direct liquid injection; gap fill properties; interconnect dielectric applications; low dielectric constant material; migrational enthalpy; molecular mobility; patterned surface; photoexcitation; rapid photothermal CVD technique; surface diffusion; vacuum ultraviolet radiation; Amorphous materials; Chemical vapor deposition; Dielectric constant; Dielectric materials; Integrated circuit interconnections; Silicon; Sputter etching; Surface topography; Temperature control; Testing;
Journal_Title :
Electron Devices, IEEE Transactions on
