• DocumentCode
    1353089
  • Title

    Developing an Automatic Virtual Metrology System

  • Author

    Cheng, Fan-tien ; Huang, Hsien-Cheng ; Kao, Chi-An

  • Author_Institution
    Inst. of Manuf. Inf. & Syst., Nat. Cheng Kung Univ., Tainan, Taiwan
  • Volume
    9
  • Issue
    1
  • fYear
    2012
  • Firstpage
    181
  • Lastpage
    188
  • Abstract
    Virtual Metrology (VM) is a method to conjecture manufacturing quality of a process tool based on data sensed from the process tool and without physical metrology operations. VM has now been designated by the International SEMATECH Manufacturing Initiative and International Technology Roadmap for Semiconductors as one of the focus areas for the next-generation factory realization roadmap of the semiconductor industry. This paper defines the VM automation levels, proposes the concept of automatic virtual metrology (AVM), and develops an AVM system for automatic and fab-wide VM deployment. The example of automatic VM model refreshing for chemical vapor deposition (CVD) tools is also illustrated in this paper. The AVM system has been successfully deployed in a fifth-generation thin-film-transistor-liquid-crystal-display (TFT-LCD) factory in Chi Mei Optoelectronics (CMO), Taiwan.
  • Keywords
    liquid crystal displays; manufacturing systems; measurement; production engineering computing; production facilities; quality control; semiconductor industry; Chi Mei Optoelectronics; TFT-LCD factory; Taiwan; automatic virtual metrology concept; automatic virtual metrology system; chemical vapor deposition tool; manufacturing quality; next-generation factory realization roadmap; process tool; semiconductor industry; thin-film-transistor-liquid-crystal-display; Accuracy; Automation; Data models; Metrology; Real-time systems; Servers; Tuning; Automatic fanning out; automatic model refreshing; automatic virtual metrology (AVM); virtual metrology (VM);
  • fLanguage
    English
  • Journal_Title
    Automation Science and Engineering, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1545-5955
  • Type

    jour

  • DOI
    10.1109/TASE.2011.2169405
  • Filename
    6051498