Title :
A dynamic-threshold SOI device with a J-FET embedded source structure and a merged body-bias-control transistor. I. A J-FET embedded source structure properties
Author :
Horiuchi, Masatada
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
fDate :
8/1/2000 12:00:00 AM
Abstract :
The floating-body effects in SOI CMOSFETs are fully suppressed by embedding a J-FET source structure immediately beneath the source/drain junction. The drain of the J-FET consists of a Schottky barrier diode; the holes generated in the body can easily be ejected into the source through the forward-biasing of this diode. The source-drain breakdown voltage and drain-induced barrier-lowering characteristics of this device are the same as those of a bulk device. With this structure, the body potential syncrhronously couples to the gate bias in the dynamic mode without potential hysteresis when the body-to-source resistance is properly designed. The inverter-chain delay time should be 45% of that of a bulk device operating at 1 V without an excess load
Keywords :
MOSFET; Schottky diodes; low-power electronics; semiconductor device breakdown; silicon-on-insulator; JFET embedded source structure; SOI CMOSFETs; Schottky barrier diode; Si; body potential; body-to-source resistance; breakdown voltage; drain-induced barrier-lowering characteristics; dynamic mode; dynamic-threshold SOI device; inverter-chain delay time; merged body-bias-control transistor; source/drain junction; CMOSFETs; Capacitance; Degradation; Delay effects; Hysteresis; Immune system; MOSFET circuits; Power engineering and energy; Schottky diodes; Threshold voltage;
Journal_Title :
Electron Devices, IEEE Transactions on