Estimation of plasma density distribution in IHC source by means of FEM calculation

Author

Sato, Mitsuhisa ; Kawaguchi, Hitoshi ; Nagai, Takayuki ; Kabasawa, Mitsuaki ; Tsukihara, Mitsukuni

Author_Institution

Eng. Div., SEN Corp., Saijo, Japan

fYear

2014

fDate

June 26 2014-July 4 2014

Firstpage

1

Lastpage

4

Abstract

In order to obtain higher beam current extraction with better quality, it is very important to identify plasma density distribution inside the indirectly heated cathode (IHC) ion source. In this paper, the calculations of the plasma density distribution are introduced, applying the finite element method (FEM) of anisotropic thermal conduction with the special modeling near the plasma sheath to ambipolar plasma diffusion. The results of calculation show good agreement with experimental results and indicate better geometry of the IHC ion source.

Keywords

cathodes; finite element analysis; heat conduction; ion implantation; ion sources; plasma density; plasma sheaths; FEM calculation; IHC source; ambipolar plasma diffusion; anisotropic thermal conduction; beam current extraction; finite element method; indirectly heated cathode ion source; plasma density distribution estimation; plasma sheath; Cathodes; Finite element analysis; Ion sources; Plasma temperature; Temperature measurement; Thermal conductivity; FEM calculation; IHC ion source; ambipolar plasma diffusion; plasma density distribution;

fLanguage

English

Publisher

ieee

Conference_Titel

Ion Implantation Technology (IIT), 2014 20th International Conference on

Conference_Location

Portland, OR

Type

conf

DOI

10.1109/IIT.2014.6940038

Filename

6940038