Formation of non-equilibrium sputtered Cr films used in thin film HD recording media

Author

Chu, J.P. ; Chang, J.W. ; Lee, P.Y.

Author_Institution

Inst. of Mater. Eng., Nat. Taiwan Univ., Taipei, Taiwan

Volume

34

Issue

2

fYear

1998

fDate

3/1/1998 12:00:00 AM

Firstpage

346

Lastpage

348

Abstract

Formation and phase transformation of non-equilibrium δ-A15 Cr thin films prepared by r.f. magnetron sputtering have been characterized. Processing parameters such as working pressure, deposition time and temperature were found to affect the formation of δ-A15 Cr films. We have demonstrated for the first time that the phase transformation of the δ-A15 Cr phase to the equilibrium α-BCC Cr phase is an irreversible, exothermic, first-order transition. Onset and peak temperatures of the transformation were determined to be 4280C and 437°C, respectively, at a heating rate of 100C/mln. Our post-deposition annealing study by X-ray diffraction further verified the occurrence of transformation

Keywords

X-ray diffraction; annealing; chromium; ferromagnetic materials; magnetic recording; magnetic thin films; solid-state phase transformations; sputtered coatings; thermal analysis; 428 degC; 437 degC; Cr; RF magnetron sputtering; X-ray diffraction; deposition time; exothermic first-order transition; heating rate; nonequilibrium sputtered films; onset temperatures; peak temperatures; phase transformation; post-deposition annealing; thin film HD recording media; working pressure; Annealing; Chromium; Crystalline materials; Heating; High definition video; Magnetic materials; Ocean temperature; Sputtering; X-ray diffraction; X-ray scattering;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.667760

Filename

667760