• DocumentCode
    1362360
  • Title

    Impact of Alpha Particles on the Electrical Characteristics of TiO _{2} Memristors

  • Author

    Barnaby, H.J. ; Malley, S. ; Land, M. ; Charnicki, S. ; Kathuria, A. ; Wilkens, B. ; DeIonno, E. ; Tong, W.M.

  • Author_Institution
    Sch. of Electr., Comput. & Energy Eng., Arizona State Univ., Tempe, AZ, USA
  • Volume
    58
  • Issue
    6
  • fYear
    2011
  • Firstpage
    2838
  • Lastpage
    2844
  • Abstract
    Titanium-oxide (TiO2 ) memristors exposed to 1-MeV alpha particles exhibit only minor changes in the electrical response for ion fluencies up to 1014 cm - 2. At higher fluence levels, virgin and off-state devices exhibit measurable increases in current conduction between the two platinum (Pt) electrodes. Analysis, supported by radiation transport and numerical device simulations, suggests that radiation-induced displacement damage in the TiO2 film increases the density of oxygen vacancies, thereby altering both resistivity in the bulk of the transition-metal oxide and the junction characteristics of Pt-TiO2 interface. Nevertheless, the experimental results indicate continued switching functionality of the memristors even after exposure to 1015 cm- 2 alpha particles. The high intrinsic vacancy density in the devices prior to radiation exposure is identified as the primary feature contributing to apparent radiation hardness.
  • Keywords
    alpha-particle effects; memristors; numerical analysis; platinum; radiation hardening (electronics); semiconductor process modelling; titanium compounds; vacancies (crystal); Pt-TiO2; Pt-titania interface; alpha particles; apparent radiation hardness; continued switching functionality; current conduction; electrical characteristics; electrical response; electron volt energy 1 MeV; fluence levels; intrinsic vacancy density; ion fluencies; junction characteristics; numerical device simulations; off-state device; oxygen vacancy density; platinum electrodes; radiation exposure; radiation transport; radiation-induced displacement damage; resistivity; titania film; titanium-oxide memristors; transition-metal oxide; virgin device; Alpha particles; Memristors; Radiation effects; Semiconductor process modeling; Titanium compounds; Alpha particles; TiO$_{2}$; displacement damage; memristor;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2011.2168827
  • Filename
    6061922