New antiferromagnetic RuRhMn film and its application for spin-valves

Author

Araki, Shunsuke ; Omata, E. ; Sano, Makoto ; Noguchi, Keisuke ; Morita, Hiroyuki ; Matsuzaki, M.

Author_Institution

Data Storage Components Bus. Group, TDK Corp., Nagano

Volume

34

Issue

2

fYear

1998

fDate

3/1/1998 12:00:00 AM

Firstpage

387

Lastpage

389

Abstract

We have successfully developed new RuRhMn antiferromagnetic (AF) films for spin-valves. The spin-valves with RuRhMn exhibit larger unidirectional anisotropy (Hua), higher blocking temperature (Tb), higher thermal stability and higher corrosion resistance than those with FeMn films. The MR ratio of 7.4% and Tb of 250°C are obtained for glass/Ta(5)-NiFe(7)-Co(0.5)-Cu(3)-Co(2.5)-RuRhMn(10)-Ta(5), unit nm, spin-valve with Hua of 350 Oe. The rest potential of RuRhMn films is listed between one of NiFe and Co films and is much better than that of FeMn films

Keywords

antiferromagnetic materials; giant magnetoresistance; hard discs; magnetic anisotropy; magnetic heads; magnetic multilayers; magnetic thin films; manganese alloys; rhodium alloys; ruthenium alloys; thermal stability; 250 degC; GMR; MR ratio; RuRhMn; antiferromagnetic film; blocking temperature; corrosion resistance; hard disk drives; magnetoresistive heads; rest potential; spin-valves; thermal stability; unidirectional anisotropy; Anisotropic magnetoresistance; Antiferromagnetic materials; Glass; Magnetic anisotropy; Magnetic field measurement; Magnetic heads; Perpendicular magnetic anisotropy; Temperature; Thermal resistance; Thermal stability;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.667771

Filename

667771