• DocumentCode
    1362496
  • Title

    In-situ n & k phase compensation in an interferometric flying height tester

  • Author

    Womack, Kenneth H. ; Butler, Allan

  • Author_Institution
    Phase Metrics, San Diego, CA, USA
  • Volume
    34
  • Issue
    2
  • fYear
    1998
  • fDate
    3/1/1998 12:00:00 AM
  • Firstpage
    459
  • Lastpage
    461
  • Abstract
    Conventional multiwavelength flying height testers rely upon an external ellipsometer for measurement of the slider´s n and k. These values are used to correct the phase offset of the interferometric signal. Typically n and k measurements obtained from a sampling of 20 to 30 sliders are averaged and the results are used indefinitely in production testing. This approach to n and k phase correction may be adequate for high flying heights but it becomes less attractive as flying heights decrease and the correction becomes a large fraction of the nominal. In the new method described here phase offset is measured when a standard retract or rpm calibration is performed. Using the calibration data, an estimate is obtained of the absolute reflectivity of the slider. Next the value of the real part n of the complex index of the slider is inferred from an independent correlation of n to the slider reflectivity. Given these two numbers-the slider reflectivity R and the real part n of the index-the phase correction for flying height is calculated using a well-known relationship giving phase shift on reflection as a function of n and R
  • Keywords
    calibration; compensation; ellipsometry; height measurement; light interferometry; magnetic heads; production testing; reflectivity; refractive index measurement; calibration; ellipsometer; in-situ phase compensation; interferometric flying height tester; production testing; refractive index; slider reflectivity; Calibration; Coatings; Glass; Phase measurement; Production; Rails; Reflection; Reflectivity; Sampling methods; Testing;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.667791
  • Filename
    667791