Title :
Numerical integral method for diffusion modeling
Author :
Tian, Xiaowei ; Strojwas, Andrzej J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fDate :
9/1/1991 12:00:00 AM
Abstract :
The authors present a numerically efficient mathematical approach, the numerical integral method, for diffusion modeling. This method extends the boundary integral methods to solve linear and nonlinear diffusion problems with physically based diffusivity models to account for concentration-dependent effects, oxidizing ambient effects, electric field effects, etc. The algorithm for solving nonlinear diffusion problems and its implementation in a computer program are described. Results from example problems are shown. This new numerical method provides the potential for achieving a diffusion simulation which is computationally efficient, numerically stable, and sufficiently accurate in an engineering environment. Such an efficient and yet accurate diffusion simulation is especially important in statistical simulation of VLSI processes
Keywords :
diffusion in solids; electronic engineering computing; integrated circuit technology; integration; modelling; numerical methods; semiconductor doping; simulation; VLSI processes; computationally efficient; computer program; concentration-dependent effects; diffusion modeling; diffusion simulation; electric field effects; linear diffusion problem; nonlinear diffusion problems; numerical integral method; numerically stable; oxidizing ambient effects; physically based diffusivity models; statistical simulation; Analytical models; Computational modeling; Finite difference methods; Fusion power generation; Impurities; Integral equations; Large scale integration; Mathematical model; Nonlinear equations; Very large scale integration;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on