• DocumentCode
    1370190
  • Title

    A 32 nm High-k Metal Gate SRAM With Adaptive Dynamic Stability Enhancement for Low-Voltage Operation

  • Author

    Kolar, Pramod ; Karl, Eric ; Bhattacharya, Uddalak ; Hamzaoglu, Fatih ; Nho, Henry ; Ng, Yong-Gee ; Wang, Yih ; Zhang, Kevin

  • Author_Institution
    Intel Corp., Hillsboro, OR, USA
  • Volume
    46
  • Issue
    1
  • fYear
    2011
  • Firstpage
    76
  • Lastpage
    84
  • Abstract
    SRAM bitcell design margin continues to shrink due to random and systematic process variation in scaled technologies and conventional SRAM faces a challenge in realizing the power and density benefits of technology scaling. Smart and adaptive assist circuits can improve design margins while satisfying SRAM power and performance requirements in scaled technologies. This paper introduces an adaptive, dynamic SRAM word-line under-drive (ADWLUD) scheme that uses a bitcell-based sensor to dynamically optimize the strength of WLUD for each die. The ADWLUD sensor enables 130 mV reduction in SRAM Vccmin while increasing frequency yield by 9% over conventional SRAM without WLUD. The sensor area overhead is limited to 0.02% and power overhead is 2% for a 3.4 Mb SRAM array.
  • Keywords
    CMOS memory circuits; SRAM chips; low-power electronics; CMOS memory circuits; SRAM array; SRAM bitcell design; SRAM power; adaptive SRAM word-line under-drive scheme; adaptive dynamic stability enhancement; bitcell-based sensor; dynamic SRAM word-line under-drive scheme; low voltage operation; metal gate SRAM; power overhead; scaled technology; size 32 nm; technology scaling; Circuit stability; Random access memory; Silicon; Temperature distribution; Temperature measurement; Temperature sensors; Transistors; 32 nm; CMOS memory integrated circuits; Vccmin; high-k+metal-gate; process variations; read assist; sram sensors; static random-access memory (SRAM); systematic variation; word-line under-drive;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/JSSC.2010.2084490
  • Filename
    5621844